Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 4 • Date Jul 1994
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Displaying Results 1 - 25 of 296
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Issue Table of Contents
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PDF (1871 KB)
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Throughput‐type pumps and ultrahigh vacuum
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PDF (1154 KB)
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History of ultrahigh vacuum pressure measurements
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PDF (1643 KB)
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Ultrahigh vacuum in the semiconductor industry
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PDF (1255 KB)
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History and current status of vacuum metallurgy
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PDF (1673 KB)
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Ultrahigh vacuum and surface science
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PDF (1273 KB)
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Development of ultrahigh vacuum technology for particle accelerators and magnetic fusion devices
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PDF (3152 KB)
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Ultrahigh vacuum/chemical vapor deposition epitaxy of silicon and germanium–silicon heterostructures
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PDF (992 KB)
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Heteroepitaxial growth of Si on GaP and GaAs surfaces by remote, plasma enhanced chemical vapor deposition
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PDF (939 KB)
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Molecular beam epitaxy grown III–V strain relaxed buffer layers and superlattices characterized by atomic force microscopy
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PDF (964 KB)
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Fabrication of relaxed Si
1-x Gex layers on Si substrates by rapid thermal chemical vapor deposition |
PDF (1107 KB)
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Low‐Knudsen‐number transport and deposition
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PDF (1388 KB)
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Comparison of boranol and silanol reactivities in boron‐doped SiO
2 chemical vapor deposition from trimethyl borate and tetraethyl orthosilicate |
PDF (880 KB)
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W nucleation on TiN from WF
6 and SiH4 |
PDF (939 KB)
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Large oscillator strength of spatially indirect electron–hole recombination at type II heterojunctions: The InAlAs/InP case
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PDF (992 KB)
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Ultraviolet photosulfidation of III–V compound semiconductors for electronic passivation
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PDF (799 KB)
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Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
