Issue 4 • Date Jul 1999
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Displaying Results 1 - 25 of 230
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Characterization of silicon oxynitride thin films by x-ray photoelectron spectroscopy
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PDF (117 KB)
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Valence band x-ray photoelectron spectroscopic studies to distinguish between oxidized aluminum species
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PDF (144 KB)
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Optical and structural characterization of copper-based colloidal particles in
SiO2 coatings
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PDF (115 KB)
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Role of surface chemistry on the nature of passive oxide film growth on Fe–Cr (low and high) steels at high temperatures
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PDF (462 KB)
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Improvements to the analysis of x-ray photoelectron spectra using a maximum entropy method for deconvolution
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PDF (115 KB)
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Quantitative high-resolution imaging with sputter-initiated resonance ionization spectroscopy
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PDF (252 KB)
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Secondary ion mass spectrometry of deep trench capacitors in dynamic random access memory
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PDF (173 KB)
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Nitrogen incorporation and trace element analysis of nanocrystalline diamond thin films by secondary ion mass spectrometry
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PDF (109 KB)
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Atomic force microscopy observation of human lymphoid cells chronically infected with the human immunodeficiency virus
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PDF (535 KB)
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Fundamental issues in wafer bonding
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PDF (1009 KB)
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Reduced carbon contaminant, low-temperature silicon substrate preparation for “defect-free” homoepitaxy
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PDF (243 KB)
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Process optimization of dielectrics chemical mechanical planarization processes for ultralarge scale integration multilevel metallization
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PDF (906 KB)
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Studies on passivation behavior of tungsten in application to chemical mechanical polishing
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PDF (119 KB)
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Low damage dry etching of III–V materials for heterojunction bipolar transistor applications using a chlorinated inductively coupled plasma
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PDF (754 KB)
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Comparison of morphology and interfacial composition of Pd ultrathin films on 6H–SiC and 4H–SiC at different annealing temperatures
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PDF (1369 KB)
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Side-wall damage in a transmission electron microscopy specimen of crystalline Si prepared by focused ion beam etching
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PDF (251 KB)
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Effects of variously configured magnets on the characteristics of inductively coupled plasmas
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PDF (178 KB)
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Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University


