Issue 3 • Date May 2008
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Displaying Results 1 - 25 of 37
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Issue Cover
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PDF (44 KB)
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Issue Table of Contents
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PDF (70 KB)
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Preparation of
TiO2 thin films on the inner surface of a quartz tube using atmospheric-pressure microplasma
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PDF (798 KB)
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Effect of gas mixing ratio on etch behavior of
ZrO2 thin films inBCl3/He inductively coupled plasma
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PDF (134 KB)
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Development of a compact vacuum- and hydrogen-annealing machine for surface transformation of silicon and its applications to micro-optical devices
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PDF (572 KB)
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Preparation of
α-Al2O3 thin films by electron cyclotron resonance plasma-assisted pulsed laser deposition and heat annealing
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PDF (89 KB)
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Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching
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PDF (815 KB)
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Characterization of high quality InN grown on production-style plasma assisted molecular beam epitaxy system
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PDF (484 KB)
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Experimental study of spatial nonuniformities in
100 MHz capacitively coupled plasma using optical probe
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PDF (636 KB)
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Preparation and microstructural characterization of TiC and
Ti0.6W0.4/TiC0.6 composite thin films obtained by activated reactive evaporation
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PDF (623 KB)
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Sputtering rate of micromilling on water ice with focused ion beam in a cryogenic environment
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PDF (360 KB)
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Mechanical properties of amorphous hydrogenated carbon films fabricated on polyethylene terephthalate foils by plasma immersion ion implantation and deposition
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PDF (574 KB)
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Multilayer transparent electrode consisting of silver alloy layer and metal oxide layers for organic luminescent electronic display device
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PDF (522 KB)
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Recombination probability of oxygen atoms on dynamic stainless steel surfaces in inductively coupled
O2 plasmas
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PDF (134 KB)
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Operational regimes of the saddle field plasma enhanced chemical vapor deposition system
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PDF (666 KB)
Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University


