Issue 3 • Date May 2006
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Displaying Results 1 - 25 of 92
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Issue Cover
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PDF (17 KB)
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Issue Table of Contents
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PDF (141 KB)
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Electron inelastic mean free path and dielectric properties of
a -boron,a -carbon, and their nitrides as determined by quantitative analysis of reflection electron energy loss spectroscopy
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PDF (238 KB)
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Effects of Pt addition on the formation of Co–ITO granular magnetoresistance films by a two-step method
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PDF (139 KB)
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Electron cyclotron resonance plasma assisted pulsed laser deposition for compound host film synthesis and in situ doping
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PDF (88 KB)
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Selective etching of high-
k HfO2 films over Si in hydrogen-added fluorocarbon (CF4/Ar/H2 andC4F8/Ar/H2 ) plasmas
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PDF (144 KB)
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Computational analysis of solid-vapor equilibria for ZnS and SrS phosphor synthesis conditions
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PDF (1824 KB)
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Electrical property improvements of yttrium oxide-based metal-insulator-metal capacitors
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PDF (158 KB)
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Vacuum science considerations for rapid reactor recovery with extremely low oxygen in low temperature low pressure chemical vapor deposition of
Si1-xGex andSi1-x-yGexCy films
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PDF (145 KB)
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Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials
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PDF (290 KB)
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Characteristics and diagnostics of an ultrahigh vacuum compatible laser ablation source for crossed molecular beam experiments
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PDF (205 KB)
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Effect of multipactor discharge on Alcator C-Mod ion cyclotron range of frequency heating
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PDF (548 KB)
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Conductance measurement of a conical tube and calculation of the pressure distribution
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PDF (609 KB)
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Mechanical properties of Cu–Al–O thin films prepared by plasma-enhanced chemical vapor deposition
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PDF (200 KB)
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Detecting free radicals during the hot wire chemical vapor deposition of amorphous silicon carbide films using single-source precursors
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PDF (220 KB)
Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University


