Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 1 • Date Jan 1999
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Displaying Results 1 - 25 of 54
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Issue Table of Contents
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PDF (37 KB)
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Homoepitaxial growth of CdTe on vicinal CdTe(100) surfaces: Reaction kinetics and mechanism
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PDF (301 KB)
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Molecular beam epitaxial growth and structural properties of
Bi1-xSbx alloy thin films on CdTe(111) substrates |
PDF (316 KB)
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Room-temperature growth of
ZrO2 thin films using a novel hyperthermal oxygen-atom source |
PDF (196 KB)
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Study of the
SiO2 -to-Si3N4 etch selectivity mechanism in inductively coupled fluorocarbon plasmas and a comparison with theSiO2 -to-Si mechanism |
PDF (485 KB)
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Response surface study of inductively coupled plasma etching of GaAs/AlGaAs in
BCl3/Cl2 |
PDF (309 KB)
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Reactive ion etching of GaN and GaAs: Radially uniform processes for rectangular, smooth sidewalls
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PDF (277 KB)
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Penning type magnetron sputtering source and its use in the production of carbon nitride coatings
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PDF (2784 KB)
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Abnormal steady states in reactive sputtering
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PDF (123 KB)
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Hollow cathode magnetron
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PDF (132 KB)
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Ferroelectric
SrBi2Ta2O9 thin film deposition at 550 °C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode |
PDF (286 KB)
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Surface roughness and oxide contents of gas-phase and solution-phase polysulfide passivation of III–V surfaces
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PDF (62 KB)
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Deposition of high quality silicon dioxide on
Hg1-xCdxTe by low-temperature liquid phase deposition method |
PDF (122 KB)
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Hydrogenated silicon nitride thin films deposited between 50 and
250 °C using nitrogen/silane mixtures with helium dilution |
PDF (94 KB)
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Deposition of diamond-like carbon films using the screen grid method in electron cyclotron resonance chemical vapor deposition
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PDF (61 KB)
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High temperature oxidation of
(Ti1-XAlX)N coatings made by plasma enhanced chemical vapor deposition |
PDF (250 KB)
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Diagnostics of the diamond depositing inductively coupled plasma by electrostatic probes and optical emission spectroscopy
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PDF (125 KB)
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Kinetics of platinum silicide formation followed in situ by spectroscopic ellipsometry
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PDF (127 KB)
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Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
