Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 5 • Date Sep 2000
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Displaying Results 1 - 25 of 93
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Issue Cover
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PDF (5 KB)
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Issue Table of Contents
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PDF (33 KB)
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Plasma etch/deposition modeling: A new dynamically coupled multiscale code and comparison with experiment
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PDF (331 KB)
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Effect of magnetic field configuration in the cathodic polymerization systems with two anode magnetrons
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PDF (323 KB)
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The role of feedgas chemistry, mask material, and processing parameters in profile evolution during plasma etching of Si(100)
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PDF (2494 KB)
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Crystallization of amorphous-silicon films with seed layers of microcrystalline silicon by plasma heating
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PDF (297 KB)
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Plasma injection with helicon sources
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PDF (312 KB)
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Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor
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PDF (505 KB)
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Investigation of Si-doped diamond-like carbon films synthesized by plasma immersion ion processing
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PDF (193 KB)
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Studies on the optimum condition for the formation of a neutral loop discharge plasma
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PDF (270 KB)
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Film growth precursors in a remote
SiH4 plasma used for high-rate deposition of hydrogenated amorphous silicon |
PDF (177 KB)
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Effects of plasma excitation power, sample bias, and duty cycle on the structure and surface properties of amorphous carbon thin films fabricated on AISI440 steel by plasma immersion ion implantation
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PDF (275 KB)
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Particle transport in a parallel-plate semiconductor reactor: Chamber modification and design criterion for enhanced process cleanliness
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PDF (336 KB)
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Electron temperature, density, and metastable-atom density of argon electron–cyclotron-resonance plasma discharged by 7.0, 8.0, and 9.4 GHz microwaves
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PDF (97 KB)
Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
