Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Issue 3 • Date May 1999
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Displaying Results 1 - 25 of 61
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Issue Cover
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PDF (4 KB)
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Issue Table of Contents
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PDF (39 KB)
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Breaking the
Ga–CH3 bond at cryogenic temperatures using atomic hydrogen. Adsorbed trimethylgallium reactivity |
PDF (145 KB)
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Effects of Ar dilution on the optical emission spectra of fluorocarbon ultrahigh-frequency plasmas:
C4F8 vsCF4 |
PDF (156 KB)
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Controller design issues in the feedback control of radio frequency plasma processing reactors
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PDF (296 KB)
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Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition
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PDF (107 KB)
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Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom source
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PDF (219 KB)
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High rate deposition of diamond-like carbon films by sheet-like plasma chemical vapor deposition
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PDF (106 KB)
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Low-temperature plasma deposition of dielectric coatings from organosilicon precursors
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PDF (115 KB)
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Patterning of fluorine-, hydrogen-, and carbon-containing
SiO2 -like low dielectric constant materials in high-density fluorocarbon plasmas: Comparison withSiO2 |
PDF (231 KB)
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Bias-assisted etching of polycrystalline diamond films in hydrogen, oxygen, and argon microwave plasmas
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PDF (588 KB)
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Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AlN
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PDF (125 KB)
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Characterization of high density
CH4/H2/Ar plasmas for compound semiconductor etching |
PDF (2148 KB)
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Smoothing of polycrystalline
Cu(In,Ga)(Se,S)2 thin films by low-energy ion-beam etching |
PDF (313 KB)
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Effect of nitric-phosphoric acid etches on material properties and back-contact formation of CdTe-based solar cells
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PDF (259 KB)
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Adsorption and thermal decomposition of
C2D5I on the (110) and (111) planes of NiAl: A temperature programmed deposition and x-ray photoelectron spectroscopy study |
PDF (167 KB)
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Ellipsometric investigation of nucleation sites for chemical vapor deposition of Si on
SiO2 andSi3N4 surfaces |
PDF (113 KB)
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Preparation and operation of hydrogen cleaned GaAs(100) negative electron affinity photocathodes
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PDF (348 KB)
Aims & Scope
The Journal of Vacuum Science and Technology A is devoted to reports of original research, review articles, and Critical Review articles.
Meet Our Editors
Editor
G. Lucovsky
North Carolina State University
