# IEEE Transactions on Plasma Science

## Issue 4  Part 1 • Aug. 2008

This issue contains several parts.Go to:  Part 2  | Part 3  | Part 4  | Part 5

## Filter Results

Displaying Results 1 - 25 of 283

Publication Year: 2008, Page(s):C1 - 861
| PDF (141 KB)
• ### IEEE Transactions on Plasma Science publication information

Publication Year: 2008, Page(s): C2
| PDF (39 KB)
• ### Fifth Triennial Special Issue on Images in Plasma Science

Publication Year: 2008, Page(s):862 - 863
| PDF (80 KB)
• ### Distribution of Ion-Current Density on Substrate Between Carbon Nanotubes Grown From Low-Temperature Plasma

Publication Year: 2008, Page(s):864 - 865
Cited by:  Papers (1)
| | PDF (306 KB) | HTML

Using Monte Carlo simulation technique, we have calculated the distribution of ion current extracted from low-temperature plasmas and deposited onto the substrate covered with a nanotube array. We have shown that a free-standing carbon nanotube is enclosed in a circular bead of the ion current, whereas in square and hexagonal nanotube patterns, the ion current is mainly concentrated along the line... View full abstract»

• ### Simulation and Visualization of Self-Assembled Nanodevice Networks Synthesized via Plasma–Surface Interaction

Publication Year: 2008, Page(s):866 - 867
| | PDF (480 KB) | HTML

Using advanced visualization techniques, a comprehensive visualization of all the stages of the self-organized growth of internetworked nanostructures on plasma-exposed surface has been made. Atomistic kinetic Monte Carlo simulation for the initial stage of deposition, with 3-D visualization of the whole system and half-tone visualization of the density field of the adsorbed atoms, makes it possib... View full abstract»

• ### Interaction of Oxygen Plasma With Aluminium Substrates

Publication Year: 2008, Page(s):868 - 869
Cited by:  Papers (8)
| | PDF (242 KB) | HTML

Inductively coupled oxygen plasma is widely used for material processing. Optical emission spectroscopy using fast miniature fiber spectrometer was used for plasma characterization and process monitoring. The images of plasma and accompanying spectra during interaction with aluminium foil are presented. View full abstract»

• ### Inductively Coupled Plasma-Assisted RF Magnetron Sputtering Deposition of Highly Uniform SiC Nanoislanded Films

Publication Year: 2008, Page(s):870 - 871
Cited by:  Papers (1)
| | PDF (308 KB) | HTML

A new deposition technique - inductively coupled plasma-assisted RF magnetron sputtering has been developed to fabricate SiC nanoislanded films. In this system, the plasma production and magnetron sputtering can be controlled independently during the discharge. The deposited SiC nanoislanded films are highly uniform, have excellent stoichiometry, have a typical size of 10-45 nm, and contain small ... View full abstract»

• ### TCP Plasma Sputtering of Nanostructured Fuel Cell Electrodes

Publication Year: 2008, Page(s):872 - 873
Cited by:  Papers (2)
| | PDF (230 KB) | HTML

A transformer-coupled plasma sputtering reactor is used for depositing porous carbon-platinum proton exchange membrane fuel cell electrodes. Carbon nanocolumns decorated by platinum nanoclusters are thus obtained. View full abstract»

• ### Dynamics of the Profile Charging During $hbox{SiO}_{2}$ Etching in Plasma for High Aspect Ratio Trenches

Publication Year: 2008, Page(s):874 - 875
Cited by:  Papers (7)
| | PDF (348 KB) | HTML

We model charging of the high aspect ratio 3-D trenches during plasma etching of dielectrics. The ion and electron fluxes were computed along the feature using Monte Carlo method. The surface potential profiles and electric field for the entire feature were generated by solving Poisson equation using finite-element method. View full abstract»

• ### Surface Modification of Composite Electrodes by Electric Arc Discharge

Publication Year: 2008, Page(s):876 - 877
| | PDF (248 KB) | HTML

The secondary structure of electrode working layers was studied. Such structure was formed under the influence of electric arc discharges on composite electrodes on copper and tungsten bases. The structural changes in the working layer of electrodes were investigated by optical and scanning electron microscopy. The influence of electrode-material composition and discharge-current magnitude on the ... View full abstract»

• ### Stochastic Plasma Charging of Nanopatterned Dielectric Surfaces

Publication Year: 2008, Page(s):878 - 879
| | PDF (328 KB) | HTML

A 2-D simulation of the plasma bombardment of high aspect ratio dielectric structures is used to demonstrate stochastic charging behavior arising as absolute dimension decreases from 500 to 50 nm. Statistical analyses are then performed after the system has evolved beyond initial charging to indicate the regions of high variability in potential and to provide representative snapshots of mean and e... View full abstract»

• ### Optical Investigation of Surface Flashover Plasma Across Silicon Stimulated by Pulsed High Voltage in Vacuum Based on ICCD

Publication Year: 2008, Page(s):880 - 881
Cited by:  Papers (1)
| | PDF (452 KB) | HTML

Optical investigation of flashover phenomena across silicon is performed in vacuum. A pulse waveform of ~0.4/2.5 mus is employed as stimulation source. The p100-type silicon wafers are the samples. The images of flashover growing are recorded by intensified charge couple device, and the corresponding waveforms of voltage and current are given. The results primarily suggest that the flashover acros... View full abstract»

• ### Synthesis of Carbon Nanofibers and Pt-Nanocluster-Based Electrochemical Microsystems by Combining Low-Pressure Helicon Plasma Techniques

Publication Year: 2008, Page(s):882 - 883
Cited by:  Papers (1)
| | PDF (199 KB) | HTML

Although carbon-nanofiber (CNFs) or nanotube growth and their applications are well documented, engineering their shape and their integration in a microsystem for successful applications is an important issue. We report on the synthesis of aligned CNFs (ACNFs) covered by metallic catalytic nanoclusters by a combination of different low-pressure deposition techniques based on high-density radio-fre... View full abstract»

• ### Transport and Deposition of Plasma-Sputtered Platinum Atoms: Comparison Between Experiments and Simulation

Publication Year: 2008, Page(s):884 - 885
Cited by:  Papers (1)
| | PDF (239 KB) | HTML

The deposition of platinum atoms by argon plasma sputtering has been simulated by using a 3-D Monte Carlo simulation called Sputtered Particles Transport in Gas, which provides spatial and energy distributions of the Pt atoms impinging on the substrate and on the chamber walls. The Yamamura formula provides the Pt sputtering yield from argon ions, whereas the initial energy distribution of sputter... View full abstract»

• ### Improved Dual-Plasma Process for the Synthesis of Coated or Functionalized Metal Nanoparticles

Publication Year: 2008, Page(s):886 - 887
Cited by:  Papers (9)
| | PDF (254 KB) | HTML

An improved dual-plasma process for the synthesis of nonagglomerated, organic layer-coated metal nanoparticles is presented. Nanoparticle synthesis is achieved by means of pulsed arc erosion of a copper cathode. Particles are coated in-flight through RF plasma polymerization of ethane. The axially symmetric geometry takes advantage of the initial nanoparticle trajectories and charging effects with... View full abstract»

• ### Two-Dimensional Spatial Profile of Volume Fraction of Nanoparticles Incorporated Into a-Si:H Films Deposited by Plasma CVD

Publication Year: 2008, Page(s):888 - 889
Cited by:  Papers (9)
| | PDF (398 KB) | HTML

Using an optical-scanning method, we obtained 2-D spatial profile of deposition rate of hydrogenated amorphous silicon (a-Si:H) films deposited by a multihollow discharge plasma CVD with a high spatial resolution. From the profile, we deduced 2-D spatial profile of the volume fraction of nanoparticles incorporated into films, since nanoparticles affect optical and electronic properties of a-Si:H f... View full abstract»

• ### Plasma-Enhanced Chemical Vapor Deposition of Amorphous Fluorocarbon Polymer Films ( $a$-C:F) on Spherical Surfaces

Publication Year: 2008, Page(s):890 - 891
Cited by:  Papers (1)
| | PDF (199 KB) | HTML

An RF capacitively coupled reactor designed for plasma-enhanced chemical vapor deposition of amorphous fluorocarbon polymer films on spherical surfaces is described. Pictures of the plasma created between the concentrically spherical electrodes, the film surface, and a cross section of the film are presented. View full abstract»

• ### Streamer Branching: The Role of Inhomogeneities and Bubbles

Publication Year: 2008, Page(s):892 - 893
Cited by:  Papers (21)
| | PDF (450 KB) | HTML

The branching of streamers in atmospheric-pressure air, dense gases, and liquids is a common occurrence whose origins are likely found with many causes, both deterministic and stochastic. In this paper, we investigate the consequences of stochastic inhomogeneities on the propensity of branching of streamers in high-pressure gases. View full abstract»

• ### Nanosecond Scale Discharge Dynamics in High Pressure Air

Publication Year: 2008, Page(s):894 - 895
Cited by:  Papers (5)
| | PDF (271 KB) | HTML

The use of pulsed nanosecond scale discharges is promising for automotive engine ignition because air-hydrocarbon mixtures can be chemically activated with a nonthermal plasma. Very short high voltage pulses are a good way to control the energy which is transferred into the gas at pressures above atmospheric. The development of such a discharge, in a point-to-plane configuration, under a short and... View full abstract»

• ### Development of Streamer Flash Initiated by HV Pulse With Nanosecond Rise Time

Publication Year: 2008, Page(s):896 - 897
Cited by:  Papers (9)
| | PDF (366 KB) | HTML

The high-voltage (HV) nanosecond discharge in wide pressure range develops in the form of the streamer discharge. Intensified charge-coupling device images of the discharge development and propagation in pure air are presented. For cathode-directed streamer, the area of streamer branching is obtained as well as dependence between branching intensity and discharge parameters. The streamer structure... View full abstract»

• ### Nanosecond Pulsed Discharge—Always Uniform?

Publication Year: 2008, Page(s):898 - 899
Cited by:  Papers (13)
| | PDF (600 KB) | HTML

High-voltage nanosecond discharge at moderate pressures develops in the form of fast ionization wave. Pulsed nanosecond discharge itself, and in combination with AC or DC voltage, is frequently used to generate spatially uniform and highly nonequilibrium plasma. The high electric field in the ionization wavefront produces high energy electrons and supports uniform preionization. Nevertheless, ther... View full abstract»

• ### Streak Images of Pulsed Discharge Development at High Overvoltage

Publication Year: 2008, Page(s):900 - 901
Cited by:  Papers (1)
| | PDF (491 KB) | HTML

Pulsed high-voltage nanosecond discharge dynamics was investigated in wide pressure range with a fast streak camera. Discharge development demonstrated both the low-current phase of a fast ionization wave or a streamer and the high-current transient stage. Transition from low- to high-current phase occurred through a sequence of flashes which developed simultaneously along the length of the discha... View full abstract»

• ### Nanosecond-Discharge Development in Long Tubes

Publication Year: 2008, Page(s):902 - 903
Cited by:  Papers (10)
| | PDF (352 KB) | HTML

High-voltage nanosecond discharge at moderate pressures develops in the form of a fast ionization wave. High electric field in the discharge front produces high-energy electrons and supports uniform preionization. The discharge creates spatially uniform and highly nonequilibrium plasma with dominant excitation of the high-energy electronic levels during tens and hundreds of nanoseconds. The develo... View full abstract»

• ### Combustion Initiated by Nonequilibrium Plasma

Publication Year: 2008, Page(s):904 - 905
Cited by:  Papers (2)
| | PDF (253 KB) | HTML

The spatial uniformity of the plasma and the combustion initiated by a high-voltage nanosecond volume discharge were investigated at gas pressures of 0.3-2.4 bar and temperatures of 850-2250 K. The experiments were carried out behind a reflected shock wave in CH4 : O2 : Ar and N2 mixtures. View full abstract»

• ### Positive Streamers in Ambient Air and a $\hbox{N}_{2}\!:\!\hbox{O}_{2}$ Mixture (99.8 :  0.2)

Publication Year: 2008, Page(s):906 - 907
Cited by:  Papers (12)
| | PDF (765 KB) | HTML

Photographs show distinct differences between positive streamers in air or in a nitrogen-oxygen mixture (0.2% O2). The streamers in the mixture branch more frequently, but the branches also extinguish more easily. Probably related to that, the streamers in the mixture propagate more in a zigzag manner, whereas they are straighter in air. Furthermore, streamers in the mixture can become ... View full abstract»

## Aims & Scope

IEEE Transactions on Plasma Sciences focuses on plasma science and engineering, including: magnetofluid dynamics and thermionics; plasma dynamics; gaseous electronics and arc technology.

Full Aims & Scope

## Meet Our Editors

Editor-in-Chief
Steven J. Gitomer, Ph.D.
Senior Scientist, US Civilian Research & Development Foundation
Guest Scientist, Los Alamos National Laboratory
1428 Miracerros Loop South
Santa Fe, NM  87505  87505  USA
tps-editor@ieee.org
Phone:505-988-5751
Fax:505-988-5751 (call first)