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IEEE Circuits and Devices Magazine

Issue 1 • Date Jan.-Feb. 2005

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Displaying Results 1 - 15 of 15
  • The end of CMOS scaling: toward the introduction of new materials and structural changes to improve MOSFET performance

    Publication Year: 2005, Page(s):16 - 26
    Cited by:  Papers (85)  |  Patents (1)
    Request permission for commercial reuse | Click to expandAbstract | PDF file iconPDF (1689 KB) | HTML iconHTML

    The rapid cadence of metal-oxide semiconductor field-effect transistor (MOSFET) scaling, as seen in the new 2003 International Technology Roadmap for Semiconductors ITRS), is accelerating introduction of new technologies to extend complementary MOS (CMOS) down to, and perhaps beyond, the 22-nm node. This acceleration simultaneously requires the industry to intensify research on two highly challeng... View full abstract»

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  • A perspective from the 2003 ITRS: MOSFET scaling trends, challenges, and potential solutions

    Publication Year: 2005, Page(s):4 - 15
    Cited by:  Papers (13)
    Request permission for commercial reuse | Click to expandAbstract | PDF file iconPDF (1242 KB) | HTML iconHTML

    The IC industry has been rapidly and consistently scaling the design rules, increasing the chip and wafer size, and cleverly improving the design of devices and circuits for over 35 years. As a result, the industry has enjoyed exponential increases in chip speed and functional density versus time combined with exponential decreases in power dissipation and cost per function versus time, as project... View full abstract»

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  • The power of functional scaling: beyond the power consumption challenge and the scaling roadmap

    Publication Year: 2005, Page(s):27 - 35
    Cited by:  Papers (9)
    Request permission for commercial reuse | Click to expandAbstract | PDF file iconPDF (1443 KB) | HTML iconHTML

    The relentless progress of silicon technology in the last few decades has been astounding, owing to device scaling. The characteristic lengths associated with successive generations of the technology have decreased, producing higher performance devices and circuits. At various times, people have predicted the end of scaling because of apparent barriers, but these barriers have fallen thanks to the... View full abstract»

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  • Frequency Selective Surfaces: Theory and Design [Book Review]

    Publication Year: 2005, Page(s): 36
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    Freely Available from IEEE
  • Advertisers Index

    Publication Year: 2005, Page(s): 40
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  • Electronic and Optoelectronic Properties of Semiconductor Structures [Book Review]

    Publication Year: 2005, Page(s): 37
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    Freely Available from IEEE
  • Integrated Passive Component Technology [Book Review]

    Publication Year: 2005, Page(s): 36
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    Freely Available from IEEE
  • VLSI Designer's interface

    Publication Year: 2005, Page(s):3 - 37
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  • IEEE Circuits & Devices

    Publication Year: 2005, Page(s): 0_1
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  • IEEE Circuits & Devices Magazine

    Publication Year: 2005, Page(s): 0_2
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    Freely Available from IEEE
  • IEEE Circuits & Devices - Table of contents

    Publication Year: 2005, Page(s): 1
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    Freely Available from IEEE
  • From the Editor - Celebrating our 21st year

    Publication Year: 2005, Page(s): 2
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    Freely Available from IEEE
  • Conference calendar

    Publication Year: 2005, Page(s):38 - 39
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  • Brain teaser challenge

    Publication Year: 2005, Page(s): 0_3
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  • Embedded Systems Conference - San Francisco - Mar. 6-10, 2005

    Publication Year: 2005, Page(s): 0_4
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    Freely Available from IEEE

Aims & Scope

IEEE Circuits and Devices Magazine (1985-2006) covers the design, implementation, packaging, and manufacture of micro-electronic and photonic devices, circuits and systems

 

This Magazine ceased publication in 2006.

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Meet Our Editors

Editor-in-Chief
Dr. Ronald W. Waynant
r.waynant@ieee.org