Semiconductor Manufacturing, IEEE Transactions on
Issue 1 • Date Feb. 2003
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Displaying Results 1 - 9 of 9
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Experimental application of a quadratic optimal iterative learning control method for control of wafer temperature uniformity in rapid thermal processing
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PDF (998 KB)
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Stochastic wafer fabrication scheduling
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PDF (505 KB)
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Modeling the influence of arsenic autodoping on the sheet resistance of epitaxial silicon films and its application to statistical process control (SPC)
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PDF (497 KB)
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Material removal regions in chemical mechanical planarization for submicron integrated circuit fabrication: coupling effects of slurry chemicals, abrasive size distribution,and wafer-pad contact area
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PDF (767 KB)
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A novel etching technology with reactive ion etching system for GaAs via-hole etching applications
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PDF (508 KB)
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Effect of interfacial and bulk organic contamination on the quality of thin silicon oxide
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PDF (452 KB)
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LPCVD silicon nitride uniformity improvement using adaptive real-time temperature control
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PDF (647 KB)
Aims & Scope
IEEE Transactions on Semiconductor Manufacturing addresses innovations of interest to the integrated circuit manufacturing researcher and professional.
Meet Our Editors
Editor-in-Chief
Dr. Sean P. Cunningham
Intel Corporation
RN4-80
2200 Mission College Boulevard
Santa Clara, CA 95054 95054 USA
sean.p.cunningham@intel.com
Phone:+1 408-653-5955
