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Electrical Overstress/Electrostatic Discharge Symposium, 2008. EOS/ESD 2008. 30th
  Date: 7-11 Sept. 2008 
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CDM analysis on 65nm CMOS: Pitfalls when correlating results between IO test chips and product level

Suzuki, T.; Hashimoto, K.; Isomura, N.; Yokota, N.; Marichal, O.; Sorgeloos, B.; Van Camp, B.; Keppens, B.
Page(s): 325-331
Abstract  | Full Text: PDF (1648 KB)
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New protection techniques and test chip design for achieving high CDM robustness

Watanabe, K.; Hiraoka, T.; Sei, T.; Numata, K.
Page(s): 332-338
Abstract  | Full Text: PDF (7468 KB)
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A.1 ESD protection targets

Duvvury, Charvaka
Page(s): 339-339
Abstract  | Full Text: PDF (101 KB)
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A2. controlling ESD in the modern cleanroom manufacturing environment (cleanrooms / ESD / ionization guidelines and considerations)

Duncan, Kevin
Page(s): 340-340
Abstract  | Full Text: PDF (99 KB)
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B1. ESD protection of high speed / high frequency circuits

Van Camp, Benjamin
Page(s): 341-341
Abstract  | Full Text: PDF (89 KB)
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B2. automated ESD rule verification & EDA tools

Gossner, Harald
Page(s): 342-342
Abstract  | Full Text: PDF (129 KB)
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B3. electrical overstress (EOS) failure causes and failure analysis

Dangelmayer, Ted
Page(s): 343-343
Abstract  | Full Text: PDF (107 KB)
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B4. automated equipment, ESD, and grounding issues

Bellmore, Donn G.
Page(s): 344-344
Abstract  | Full Text: PDF (101 KB)
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C1. system level stress and the impact on device ESD protection

Smedes, Theo
Page(s): 345-345
Abstract  | Full Text: PDF (83 KB)
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C2. TCAD for ESD

Schenkel, Michael
Page(s): 346-346
Abstract  | Full Text: PDF (91 KB)
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C.3 The challenge of CDM testing

Ashton, Robert
Page(s): 347-347
Abstract  | Full Text: PDF (91 KB)
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C4. ESD control and design for extremely sensitive (“Class 0”) devices

Heymann, Steve
Page(s): 348-348
Abstract  | Full Text: PDF (91 KB)
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Biographies

Page(s): xxiii-lvi
Abstract  | Full Text: PDF (355 KB)
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1979 to 2008 – 30 years of EOS/ESD symposia serving and advancing industry

Page(s): lvii-lviii
Abstract  | Full Text: PDF (5055 KB)
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