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Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

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Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International

Date 29-31 Oct. 2003

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Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference

Technology roadmap and beyond

Overview of nanotechnology and TND in Korea

Impact of mask enhancer on 65-nm node contacts

An innovative method for contact hole printing with binary mask and single exposure

Patterning strategy for random contact holes in ultra-low k₁ lithography condition

Application of electron projection lithography to contacts in 65 nm node and beyond

Most efficient alternative as a way of sub-80 nm contact holes and trenches formation

Fabrication of 65 nm hole pattern in 157 nm lithography

In-situ observation of formation process of self-assembled Si islands on buried SiO₂ and their crystallographic structures

Growth of silicon nanocrystals with high number density for floating dot memory

Characterization of electronic transport through Si dot with Ge core using AFM conducting probe

Nano-scale device modeling and simulation: FinFET

Fabrication of combined structure of silicon single-electron pump with an extra island and MOSFET charge detector

Optical properties of In/sub 0.8/Ga/sub 0.2/As self-assembled quantum dots on SiO/sub 2/-patterned [001] vicinal GaAs substrates

Potentials of immersion lithography

The magnitude of potential exposure tool induced CD and OL errors in the double exposure dipole (DDL) for 65 nm and 45 nm technology nodes

CD shrink process with cure and bake

Quantitative evaluation of grid size effect on CD uniformity improvement

Characterized optical constants of thin films for vacuum ultraviolet lithography applications

Low temperature, atmospheric pressure plasma processing of materials

Metal filling in deep nano trenches/holes using supercritical carbon dioxide

Autocloning Ta/sub 2/O/sub 5//SiO/sub 2/ multilayer deposition by reactive ECR sputtering for photonic crystals

Use of plasma treatment in the sol-gel process of ferroelectric (Bi,La )/sub 4/Ti/sub 3/O/sub 12/ thin films for crystalline orientation control

Microcrystalline silicon thin film formation using pulse modulated microwave plasma

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