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Atmospheric Discharges for Chemical Synthesis (Ref. No. 1998/244), IEE Colloquium on

Date 18 Feb 1998

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Displaying Results 1 - 8 of 8
  • Thermal plasma processes for use in research and development

    Publication Year: 1998, Page(s):6/1 - 6/4
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (196 KB)

    The chemical use of plasmas for various applications has gained more importance in recent years. Examples are large scale deposition, surface modification, chemical conversion and effluent gas treatment. The plasmas are characterised by very large energy density and a high degree of activation. As the energy is applied by DC, RF or microwave form and large flows are employed, plasmas can be varied... View full abstract»

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  • Tetronics plasma systems

    Publication Year: 1998, Page(s):5/1 - 5/2
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (156 KB)

    Five types of DC plasma technology have been described and typical material processing applications mentioned. The relative merits of each type of system have been highlighted and ratings of Tetronics plasma torches have been presented for application to these areas View full abstract»

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  • Some properties of surface discharges

    Publication Year: 1998, Page(s):3/1 - 3/2
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (152 KB)

    Electrical discharges can occurring in a gas, liquid or a vacuum in close vicinity to a solid dielectric surface. Such a discharge is known as a surface discharge. As a result of the proximity of the discharge plasma to the surface considerable degradation of the solid dielectric surface can occur. This can subsequently lead to electrical failure and thus studies of surface discharges can be of im... View full abstract»

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  • Thermal plasma processes for use in research and development

    Publication Year: 1998, Page(s):7/1 - 7/5
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (208 KB)

    Many potential thermal plasma processes exist, however surprisingly few processes have been developed to the stage of commercial viability. Possible processes exist where the scale and the potential gain is such that the high costs of process development cannot be justified and versatile equipment at moderate cost suitable for small scale evaluation at power levels below 500 kW does not exist. Equ... View full abstract»

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  • IEE Colloquium on Atmospheric Discharges for Chemical Synthesis (Ref. No.1998/244)

    Publication Year: 1998
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (36 KB)

    The following topics are dealt with: atmospheric pressure discharges for chemical synthesis; properties of microwave-generated atmospheric plasmas; development of industrial processing capability by atmospheric pressure cool plasma; long guided surface-discharges in air; treatment of industrial wastes by plasma technology; Tetronics plasma systems; thermal plasma processes for use in research and ... View full abstract»

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  • Treatment of industrial wastes by plasma technology

    Publication Year: 1998, Page(s):4/1 - 4/3
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (168 KB)

    As the land disposal of untreated wastes becomes less acceptable increasing attention is being given by industry and government to alternative hazardous waste treatment and destruction processes. Among these processes are high-temperature incinerators and other thermal process that treat waste streams by exposing the wastes to high temperatures. One of the emerging technologies receiving much atte... View full abstract»

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  • Properties of microwave-generated, atmospheric pressure plasmas

    Publication Year: 1998, Page(s):1/1 - 1/3
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (204 KB)

    The chief advantage of atmospheric-pressure plasmas for technological applications is the much greater flexibility afforded by the absence of a vacuum vessel. In principle this allows large-scale, continuous processing instead of the small-scale, batch processing associated with low pressure plasmas. The price to be paid for lack of control over the pressure is a restriction in the range of parame... View full abstract»

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  • Development of industrial processing capability by atmospheric pressure, cool plasma

    Publication Year: 1998, Page(s):2/1 - 2/2
    IEEE is not the copyright holder of this material | Click to expandAbstract | PDF file iconPDF (112 KB)

    A major constraint on current plasma technology is that the systems operate at low pressure with a closed perimeter typically allowing only off-line, batch processing of discrete workpieces at low to moderate throughput levels. These limitations are addressed by atmospheric pressure plasmas (APP) which offer open perimeter systems providing on-line continuous processing of large area, high through... View full abstract»

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