Integrated Reliability Workshop Final Report, 2009. IRW '09. IEEE International
Date 18-22 Oct. 2009
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Displaying Results 1 - 25 of 53
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[Front and back covers]
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PDF (1281 KB)
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[Title page]
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PDF (39 KB)
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[Copyright notice]
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PDF (57 KB)
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Contents
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PDF (109 KB)
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Foreword
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PDF (83 KB)
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Reliability in the more than moore landscape
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PDF (91 KB)
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New failure mechanism during high temperature storage testing and its application on SIV risk evaluation
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PDF (1157 KB)
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Electric field dependent switching and degradation of Resistance Random Access Memory
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PDF (782 KB)
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A study of NBTI by the statistical analysis of the properties of individual defects in pMOSFETS
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PDF (569 KB)
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Interfacial engineering of InGaAs/high-k metal-oxide-semiconductor field effect transistors (MOSFETs)
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PDF (347 KB)
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CU interconnect immortality criterion based on electromigration void growth saturation
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PDF (475 KB)
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Comprehensive characterization of BEOL-TDDB performance using very fast Voltage ramp Dielectric Breakdown tests
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PDF (518 KB)
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Application of fast wafer-level reliability PBTI tests for screening of High-k / Metal Gate process splits
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PDF (334 KB)
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Comprehensive analysis of the degradation of a lateral DMOS due to hot carrier stress
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PDF (380 KB)
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