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CMOS Photodetectors Integrated With Plasmonic Color Filters

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6 Author(s)
Qin Chen ; Sch. of Eng., Univ. of Glasgow, Glasgow, UK ; Chitnis, D. ; Walls, K. ; Drysdale, T.D.
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A single-pixel plasmonic complementary metal oxide semiconductor (CMOS) photo sensor consisting of a plasmonic color filter integrated on a CMOS photodiode was fabricated using electron beam lithography and dry etch. The photocurrent measurement results confirmed the three primary color filtering responses that could be achieved in a single layer of nanostructured aluminium film. Finite-difference time-domain simulation demonstrated a good agreement of the reflection spectra with the measured result. This research can lead to the development of advanced CMOS image sensors with low cost and low crosstalk.

Published in:

Photonics Technology Letters, IEEE  (Volume:24 ,  Issue: 3 )

Date of Publication:

Feb.1, 2012

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