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Second-order optical nonlinearity and change in refractive index in silica glasses by a combination of thermal poling and x-ray irradiation

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3 Author(s)
Kameyama, Akihiro ; Department of Electrical and Electronic Engineering, University of Miyazaki, Miyazaki 889-2192, Japan ; Yokotani, Atsushi ; Kurosawa, Kou

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Second-order optical nonlinearity was found to be generated in high-purity silica glasses when they were exposed to x-ray radiation and then thermally poled. Two kinds of second-order optical nonlinearity, near-surface nonlinearity localized in a thin layer near the sample surface and bulk nonlinearity spreading throughout the whole sample, were observed. The maximum χ33(2) values of near-surface and bulk nonlinearity were 0.20 and 0.43 pm/V, respectively. Further, a change in refractive index of Δn=4×10-3 was also observed in the sample. The χ33(2) value of the bulk nonlinearity and the change in refractive index increased with the x-ray intensity. On the other hand, the χ33(2) value of the near-surface nonlinearity had a tendency to saturate when the intensity was higher than 1.3 mW/cm2. Based on absorption spectra of the samples, both the bulk nonlinearity and the refractive index change were found to be associated with point defects such as the E center (Si∙) and nonbridging oxygen ions (NBO-,Si–O-). © 2004 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:95 ,  Issue: 8 )