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Monitoring VLSIC fabrication processes: a Bayesian approach

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4 Author(s)
Rao, S. ; Dept. of Stat., Carnegie Mellon Univ., Pittsburgh, PA, USA ; Strojwas, A. ; Lehoczky, J. ; Schervish, M.

We have developed a process monitoring system, in a Bayesian framework, which is designed to be used for monitoring VLSIC and other multi-stage manufacturing processes. For a single step process, the Bayesian monitor is at least as good as the Shewhart-CUSUM combination charts for detecting changes in the distribution of the in-lines collected from the step. For a multi-stage process, however, the Bayesian monitor can significantly reduce the detection time by using in-line correlation information from earlier stages.

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995

Date of Conference:

13-15 Nov 1995