Microfabrication and Characterization of a Selectively Metallized W-Band Meander-Line TWT Circuit
Sengele, S. Hongrui Jiang Booske, J.H. Kory, C.L. van der Weide, D.W. Ives, R.L.
Dept. of Electr. & Comput. Eng., Univ. of Wisconsin-Madison, Madison, WI;
This paper appears in: Electron Devices, IEEE Transactions on Accepted for future publication
First Published:
2009-04-03
ISSN: 0018-9383
Digital Object Identifier: 10.1109/TED.2009.2015416
Abstract
Vacuum electronic devices offer significant potential for increased power and performance at millimeter-wave frequencies. However, new approaches are required to reliably manufacture the miniature electromagnetic circuits used at these high frequencies. In this paper, we describe the design, fabrication, and testing of an innovative meander-line slow-wave structure for a W-band traveling-wave tube (TWT). The unique challenge of metallizing only the top of a high-aspect-ratio serpentine dielectric ridge using conventionally planar microfabrication techniques is overcome using a novel selective masking and metallization process. The procedure is demonstrated by fabricating a W-band meander-line circuit for a 10-W continuous-wave TWT. Cold-test S -parameter measurements are presented.
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