Relationships among properties of sputtered thin films andsputtering process parameters
Kolar, M.
Mach, P.
Dept. of Electrotechnol., Czech Tech. Univ., Prague;
Abstract
This paper focuses on the investigation of the influence of
process parameters (pressure, applied power, sputtering time) during the
radio frequency magnetron sputtering of nickel, aluminum and combined
aluminum-silicon on properties of thin films. The experiments were
carried out on the BALZERS PLS 160 radio frequency magnetron sputtering
unit, using an argon atmosphere. The sheet resistance and the thickness
of the films were measured. The influence of temperature on the sheet
resistance was examined as well
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