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Imperfection-immune VLSI logic circuits using Carbon Nanotube Field Effect Transistors
Mitra, S.   Jie Zhang   Patil, N.   Hai Wei  
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA;

This paper appears in: Design, Automation & Test in Europe Conference & Exhibition, 2009. DATE '09.
Publication Date: 20-24 April 2009
On page(s): 436-441
Location: Nice,
ISSN: 1530-1591
ISBN: 978-1-4244-3781-8
INSPEC Accession Number: 10757828
Current Version Published: 2009-06-23

Abstract
Carbon nanotube field-effect transistors (CNFETs) show big promise as extensions to silicon-CMOS because: 1) Ideal CNFETs can provide significant energy and performance benefits over silicon-CMOS, and 2) CNFET processing is compatible with existing silicon-CMOS processing. However, future gigascale systems cannot rely solely on existing chemical synthesis for guaranteed ideal devices. VLSI-scale logic circuits using CNFETs must overcome major challenges posed by: 1) Misaligned and mis-positioned Carbon Nanotubes (CNTs); 2) Metallic CNTs; and, 3) CNT density variations. This paper performs detailed analysis of the impact of these challenges on CNFET circuit performance. A combination of design and processing techniques, presented this paper, can enable VLSI-scale CNFET logic circuits that are immune to high rates of inherent imperfections. These techniques are inexpensive compared to traditional defect- and fault-tolerance, do not impose major changes in VLSI design flows, and are compatible with VLSI processing because they do not require special customization on chip-by-chip basis.

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