Micromachined planar inductors on silicon wafers for MEMSapplications
Ahn, C.H.
Allen, M.G.
Sch. of Electr. Eng., Georgia Inst. of Technol., Atlanta, GA;
This paper appears in: Industrial Electronics, IEEE Transactions on
Publication Date: Dec 1998
Volume: 45,
Issue: 6
On page(s): 866-876
ISSN: 0278-0046
References Cited: 40
CODEN: ITIED6
INSPEC Accession Number: 6113419
Digital Object Identifier: 10.1109/41.735330
Current Version Published: 2002-08-06
Abstract
This paper describes three micromachined planar inductors (a
spiral type, a solenoid type, and a toroidal meander type) with
electroplated nickel-iron permalloy cores which have been realized on a
silicon wafer using micromachining techniques. The electrical properties
among the fabricated inductors are compared and the related fabrication
issues are discussed, with emphasis on the low-temperature
CMOS-compatible process, the high current-carrying capacity, the high
magnetic flux density, the closed magnetic circuits, and the low product
cost. The micromachined on-chip inductors can be applied for magnetic
microelectromechanical systems devices, such as micromotors,
microactuators, microsensors, and integrated power converters, which
envisages new micropower magnetics on a chip with integrated circuits
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