A novel in-line automated metrology for photolithography
Leang, S.
Spanos, C.J.
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA;
This paper appears in: Semiconductor Manufacturing, IEEE Transactions on
Publication Date: Feb 1996
Volume: 9,
Issue: 1
On page(s): 101-107
ISSN: 0894-6507
References Cited: 22
CODEN: ITSMED
INSPEC Accession Number: 5209622
Digital Object Identifier: 10.1109/66.484289
Current Version Published: 2002-08-06
Abstract
Novel metrology has been developed for measuring in situ film
thickness and absorption coefficient simultaneously. Designed
specifically for photolithography processes, this metrology if applied
to photoresist films, can measure thickness and photoactive compound
concentration in situ, which are important parameters for
photolithography process control and diagnosis
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