Massively parallel algorithms for scattering in optical lithography
Guerrieri, R.
Tadros, K.H.
Gamelin, J.
Neureuther, A.R.
Dipartimento di Elettronica e Inf., Bologna Univ. ;
Abstract
A novel massively parallel technique for rigorous simulation of
topography scattering in optical lithography has been developed and
tested. The method is equivalent to the time-domain finite-difference
method (TDFDM) used in electromagnetic scattering simulations, but
exploits the parallel nature of wave propagation and the power of recent
massively parallel architectures such as the Connection Machine. A
working code called TEMPEST has been implemented on a Connection Machine
CM-2 having 1 to 32 K processors with up to 1 M virtual processors.
Numerical accuracy comparable with that of other fully rigorous methods
was achieved. A very significant finding was that the solution required
constant time per iteration for problems ranging from a few thousand
unknowns up to one million, provided the ratio between the problem size
and the number of processors is kept constant. The suitability of
TEMPEST for solving a large class of topography structures important in
alignment, metrology, and lithography is illustrated by examples
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