On the utility of run to run control in semiconductor manufacturing
Musacchio, J.
Rangan, S.
Spanos, C.
Poolla, K.
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA;
This paper appears in: Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Publication Date: 6-8 Oct 1997
On page(s): D9-12
Meeting Date: 10/06/1997 - 10/08/1997
Location: San Francisco, CA, USA
ISBN: 0-7803-3752-2
References Cited: 10
INSPEC Accession Number: 6016243
Digital Object Identifier: 10.1109/ISSM.1997.664523
Current Version Published: 2002-08-06
Abstract
Run to Run (RTR) control uses data from past process runs to
adjust settings for the next run. By making better use of existing
in-line metrology and actuation capabilities, RTR control offers the
potential of reducing variability in manufacturing with minimal capital
cost. In this paper, we survey the types of equipment models that can be
used for RTR control, compare existing RTR control algorithms, and
discuss issues affecting the potential utility of RTR control
Index
Terms
Available to subscribers and IEEE members.
References
Available to subscribers and IEEE members.
Citing Documents
Available to subscribers and IEEE members.
Cart
