Control of photoresist properties: a Kalman filter based approach
Palmer, E.
Wei Pen
Spanos, C.J.
California Univ., Berkeley, CA;
This paper appears in: Semiconductor Manufacturing, IEEE Transactions on
Publication Date: May 1996
Volume: 9,
Issue: 2
On page(s): 208-214
ISSN: 0894-6507
References Cited: 13
CODEN: ITSMED
INSPEC Accession Number: 5278516
Digital Object Identifier: 10.1109/66.492814
Current Version Published: 2002-08-06
Abstract
The photolithography step in the semiconductor manufacturing
process becomes increasingly critical as linewidths decrease for the
next generation of integrated electronics. It therefore becomes
necessary to reduce variations in photoresist parameters such as resist
film thickness and photoactive compound concentration during
manufacture. In this paper, we present a simple feedback scheme for
accurately regulating these parameters. Our approach involves obtaining
a simple, static process model the coefficients of which are recursively
adjusted based on previous wafer measurements. We use this adaptive
model to determine appropriate input setpoints for the next wafer. The
effectiveness of this scheme in reducing process drift is exhibited by
experimental data. Our results supports the widespread contention that
modern feedback control offers the promise of improving the
semiconductor manufacturing processes, often with relative ease and
minimal capital cost
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