Advanced lithography for ULSI
Bokor, J.
Neureuther, A.R.
Oldham, W.G.
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA;
This paper appears in: Circuits and Devices Magazine, IEEE
Publication Date: Jan 1996
Volume: 12,
Issue: 1
On page(s): 11-15
ISSN: 8755-3996
References Cited: 4
CODEN: ICDMEN
INSPEC Accession Number: 5192027
Digital Object Identifier: 10.1109/101.481203
Current Version Published: 2002-08-06
Abstract
Lens technology has advanced to the point where lithographic
feature sizes equal to, or even smaller than, the wavelength of the
light used in the stepper can be achieved in production. How far optical
lithography can go from here depends both on how short a wavelength is
possible and how close we can come to the absolute limit of diffraction.
In this article, we will examine the current thinking on these
questions, and discuss what might happen if and when optical lithography
really can no longer be used
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