Abstract:
Coupled process and device simulation has become an important tool for reducing the cost of technology development. In this paper the 2D-process/device simulation interfa...Show MoreMetadata
Abstract:
Coupled process and device simulation has become an important tool for reducing the cost of technology development. In this paper the 2D-process/device simulation interface KYOKO is introduced which coarsens the process simulated device structure to increase the device simulation efficiency drastically. In addition the influence of this coarsening step is evaluated for the example of an NMOS transistor.<>
Published in: Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V
Date of Conference: 05-06 June 1994
Date Added to IEEE Xplore: 06 August 2002
Print ISBN:0-7803-1867-6
