Real-time statistical process control using tool data[semiconductor manufacturing]
Spanos, C.J.
Guo, H.-F.
Miller, A.
Levine-Parrill, J.
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA;
This paper appears in: Semiconductor Manufacturing, IEEE Transactions on
Publication Date: Nov 1992
Volume: 5,
Issue: 4
On page(s): 308-318
ISSN: 0894-6507
References Cited: 22
CODEN: ITSMED
INSPEC Accession Number: 4333945
Digital Object Identifier: 10.1109/66.175363
Current Version Published: 2002-08-06
Abstract
A process monitoring scheme that takes advantage of real-time
information in order to generate malfunction alarms is described. This
is accomplished with the application of time-series filtering and
multivariate statistical process control. This scheme is capable of
generating alarms on a true real-time basis, while the wafer is still in
the processing chamber. Several examples are presented with tool data
collected from the SECSII port of single-wafer plasma etchers
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