Statistical process control in semiconductor manufacturing
Spanos, C.J.
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA;
This paper appears in: Proceedings of the IEEE
Publication Date: Jun 1992
Volume: 80,
Issue: 6
On page(s): 819-830
ISSN: 0018-9219
References Cited: 28
CODEN: IEEPAD
INSPEC Accession Number: 4242938
Digital Object Identifier: 10.1109/5.149445
Current Version Published: 2002-08-06
Abstract
The author presents a brief survey of standard SPC (statistical
process control) schemes, and illustrates them through examples taken
from the semiconductor industry. These methods range from contamination
control to the monitoring of continuous process parameters. It is noted
that, even as SPC is transforming IC production, the peculiarities of
semiconductor manufacturing technology are transforming SPC. Therefore,
the author describes novel SPC applications which are now emerging in
semiconductor production. These methods are being developed to monitor
the short production runs that are characteristic of flexible
manufacturing. Additional SPC techniques suitable for in situ
multivariate sensor readings are also discussed
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