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Optomechanical model of surface micromachined tunable optoelectronic devices

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3 Author(s)
Chien-Chung Lin ; Solid State & Photonics Lab., Stanford Univ., CA, USA ; W. A. Martin ; J. S. Harris

Linewidth is a critical performance parameter for many optoelectronic devices. We have developed a combined optical and mechanical simulation tool and demonstrate its application to micromachined vertical-cavity tunable optoelectronic devices. The deformation of the mirror surface is calculated from the area moment method. The optical field distribution is calculated by the Fox-Li method, and the diffraction losses are estimated from second-order perturbation theory. By comparison to experimental results, we find that the deformation of the central plate is well predicted by our theory. While deformation can be a major source of linewidth broadening in MEMS tunable optoelectronic devices, it is not the primary source in our devices

Published in:

IEEE Journal of Selected Topics in Quantum Electronics  (Volume:8 ,  Issue: 1 )