Statistical experimental design was used to explore the effects of the HEMT channel growth parameters on device performance. A 22 full-factorial central composite circumscribed Box-Wilson design with three center points was implemented. The growth parameters under investigation were the channel growth temperature and interface formation, both of which greatly impact device operation. Interface formation was defined as the method used to form the InAs/AlSb interface
Published in:
Semiconductor Device Research Symposium, 2001 International
Date of Conference: 2001