Enhanced perpendicular coercive force of CoCr film formed on a very thin initial sublayer

Perpendicular coercivity of CoCr sputtered films on Ti adhesive layers decreases drastically as RF sputtering power increases. A very thin CoCr sublayer deposited at low power enhances the coercivity of the succeeding CoCr layer. Magnetic properties and segregated microstructures show that the initial segregated microstructure is inherited by the main CoCr layer even though the RF sputtering power changes during the sputtering process. Its segregated microstructure is enhanced by the initial 100-AA segregated structure.<
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