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Interconnect strategies for deep submicron CMOS manufacture

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2 Author(s)
Mark, C. ; Center for Adv. Interconnect Sci. & Technol., Rensselaer Polytech. Inst., Troy, NY, USA ; Rose, K.

As CMOS chips are scaled to deep submicron dimensions, interconnect strategy remains a key gateway for performance and manufacturability. ITRS'99 projections seriously underestimate the number of wiring levels required, even though inductance effects can significantly reduce wiring level requirements. By examining the requirements for a Multimedia Internet Processor, we project more reasonable wiring level requirements. The effects of alternative interconnect materials are considered, and the importance of appropriate interconnect strategies is emphasized

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI

Date of Conference:

2000