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Evaluation of high-T0 1.3 μm strained quantum well lasers on InGaAs ternary substrates by frequency response

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7 Author(s)
Sekine, N. ; RWCP Opt. Interconnection Fujitsu Lab., Atsugi, Japan ; Otsubo, K. ; Nishijima, Y. ; Aoki, O.
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We have fabricated 1.3 μm strained quantum well lasers on InGaAs ternary substrate. A low threshold current density of <80 A/cm 2/well and high T0 of >100 K were simultaneously realized. Furthermore, it was found that dg/dn of the sample was enhanced by the effect of the deep potential well. By improving the quality of InGaAs substrates, larger dg/dn should be obtainable

Published in:

Lasers and Electro-Optics Society 2000 Annual Meeting. LEOS 2000. 13th Annual Meeting. IEEE  (Volume:2 )

Date of Conference:

2000