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Determination of implanted layer depth in silicon by electrochemical C-V technique

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3 Author(s)
Hulenyi, L. ; Dept. of Microelectron., Slovak Univ. of Technol., Bratislava, Slovakia ; Kinder, R. ; Satka, A.

A method for determining the carrier concentration profile N(x) and the depth of p+-n junction boron implanted silicon using the electrochemicaI capacitance-voltage method, and EBIC (electron beam induced current) is presented. The above mentioned methods were found to be suitable for characterizing the implantation process. Experimental results have been compared with theoretical ones based on Gauss NG (x) and Pearson IV Np(X) distributions and with those obtained by means of EBIC

Published in:

Advanced Semiconductor Devices and Microsystems, 2000. ASDAM 2000. The Third International EuroConference on

Date of Conference:

2000