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Approaching the 35 nm technology node: technical requirements and key challenges in front-end processing

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1 Author(s)
R. Cleavelin ; Front End Processes Div., SEMATECH, USA

Summary form only given. The 1999 International Technology Roadmap for Semiconductors (ITRS) is currently being developed and is scheduled for release in November 1999. Key to this roadmap is the evolutionary development of manufacturable front-end processes that will help the industry maintain the historical product performance trend. This talk will focus on the key challenges, technology requirements and potential solutions as presented in the roadmap in the Front-End Process (FEP) areas of starting materials, surface preparation, etch, doping, thermal/thin films and device modeling, The talk will also explore the FEP grand challenge: a CMOS compatible, robust, high-K dielectric gate stack process

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI

Date of Conference:

1999