Referenced Items are not available for this document.
We describe the fabrication and properties of high critical current density (J/sub c/) Nb/AlO/sub x//Nb Josephson junctions with deep-submicron dimensions. The junctions are fabricated using a planarized process in which all levels are patterned using a combination of optical and electron-beam lithography. The base and counter electrodes are defined by reactive ion etching using quartz etch masks to give a minimum feature size of 0.2 microns. For J/sub c/=2.1 mA//spl mu/m/sup 2/ and junction area less than 0.1 /spl mu/m/sup 2/ the devices are self-shunted and exhibit nonhysteretic I-V characteristics. A small hysteresis in the larger junctions is caused by heating in the electrodes.
Published in:
Applied Superconductivity, IEEE Transactions on
(Volume:9
,
Issue:
2
)
Date of Publication: June 1999
- Page(s):
- 3247 - 3250
- ISSN :
- 1051-8223
- INSPEC Accession Number:
- 6356782
- Digital Object Identifier :
- 10.1109/77.783721
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 06 August 2002
- Issue Date :
- June 1999
- Sponsored by :
- The IEEE Council on Superconductivity
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