Cart (Loading....) | Create Account
Close category search window
 

Properties of high-T/sub c/ ramp-edge junctions with a Ga-doped YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// barrier

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
I-Hun Song ; Electron. Mater. Lab., Samsung Adv. Inst. of Technol., Suwon, South Korea ; Eun-Hong Lee ; Insang Song ; Gwangseo Park

We have fabricated high-T/sub c/ ramp-edge junctions with a Ga-doped YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// (YBCO) barrier in the trilayer geometry of YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta///YBa/sub 2/Cu/sub 2.79/Ga/sub 0.21/O/sub 7-/spl delta///YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// on LaAlO/sub 3/ single crystals. Interface resistances of the junctions were drastically reduced by using in-situ RF plasma cleaning treatment. The cross-sectional images of the interface of the junctions were analyzed by high resolution transmission electron microscopy. The temperature dependences of critical currents and junction resistances were consistent with the behavior predicted by the conventional proximity effect. The critical currents of the Ga-doped junctions were less sensitive to the variation of the barrier thickness compared to those of the other junctions. The increase of the barrier resistivity by Ga-doping resulted in an enhancement of the I/sub c/R/sub n/ values, up to 320 /spl mu/V at 60 K.

Published in:

Applied Superconductivity, IEEE Transactions on  (Volume:9 ,  Issue: 2 )

Date of Publication:

June 1999

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.