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A rapid modeling technique for measurable improvements in factory performance

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3 Author(s)
A. Peikert ; Siemens Microelectron. Center, Dresden, Germany ; J. Thoma ; S. Brown

This paper discusses a methodology for quickly investigating problem areas in semiconductor wafer fabrication factories by creating a model for the production area of interest only (as opposed to a model of the complete factory operation). All other factory operations are treated as “black boxes”. Specific assumptions are made to capture the effect of re-entrant flow. This approach allows a rapid response to production questions when beginning a new simulation project. The methodology was applied to a cycle-time and capacity analysis of the photolithography operation for Siemens' Dresden wafer fab. The results of this simulation study are presented

Published in:

Simulation Conference Proceedings, 1998. Winter  (Volume:2 )

Date of Conference:

13-16 Dec 1998