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A compact X-ray lithography lattice using superferric magnets

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5 Author(s)
Swenson, C.A. ; Texas Accel. Center, The Woodlands, TX, USA ; Huson, F.R. ; MacKay, W.W. ; Chen, L.K.
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A conceptual lattice design for a very compact superconducting synchrotron dedicated to X-ray lithography is presented. The synchrotron radiation produced in the high field superconducting magnets has a critical wavelength of 10 Å at a beam energy of about 787 MeV. The size and angular divergence of the beam in this lattice can satisfy the future requirements for X-ray lithography: σx,y⩽1 mm and σx,y⩽1 mr. An optimization of these two lithography parameters for this lattice configuration is presented. The design philosophy advocated is as follows: (1) simplify the light source dipole magnet design by removing the radial field gradient; (2) select the largest dipole field strengths where ferric magnets can be constructed efficiently; (3) determine the minimal lattice configuration where the optical source properties for lithography can be satisfied; and (4) design a compact intermediate energy injection system to avoid the problems associated with low-energy injection

Published in:

Particle Accelerator Conference, 1989. Accelerator Science and Technology., Proceedings of the 1989 IEEE

Date of Conference:

20-23 Mar 1989