Effects of process parameters on particle formation in SiH/sub 4/-N/sub 2/O PECVD and WF/sub 6/ CVD processes

Particle beam mass spectroscopy is used to determine the effects of various process parameters on particle production in PECVD of SiO/sub 2/ from silane and nitrous oxide and the thermal deposition of tungsten using both silane and hydrogen reductions of WF/sub 6/. In all cases, the substrate temperature played a critical role in determining the concentration of particles observed in the effluent. Plasma power (in the PECVD process) and pressure (in the thermal processes) were also important variables. The real time capability of the system was used to demonstrate transient particle effects in all processes.