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Atom lithography using standing-wave quenching

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7 Author(s)
Johnson, K.S. ; Dept. of Phys., Harvard Univ., Cambridge, MA, USA ; Thywissen, J.H. ; Dekker, N.H. ; Chu, A.P.
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Summary form only given.We used spatially dependent optical pumping in a standing wave to create nanostructures using metastable argon and resist-based atom lithography. Although the localization is caused by spontaneous emission, the matter wave diffraction and the mechanical effects of the light affect the resulting atomic localization. We investigate the role of the spontaneous emission.

Published in:

Quantum Electronics Conference, 1998. IQEC 98. Technical Digest. Summaries of papers presented at the International

Date of Conference:

8-8 May 1998