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Summary form only given. A simple method for the microfabrication of vacuum-deposited organic light-emitting diodes (OLEDs) has been developed to form micropixel arrays of light-emitting devices. These arrays have applications in high-definition displays. The devices were fabricated using a 60-nm-thick hole transport layer of N,N'-diphenyl-N,N'-bis(3-methylphenyl)[1,1'-biphenyl]-4,4'-diamine (TPD) that was deposited on an ITO/glass substrate. Next, a 50-nm layer of tris(8-hydroxyquinoline) Alq/sub 3/ was deposited to provide an electron-transporting and light-emitting medium. A 100-nm Mg layer capped with 200 nm of Al was vacuum deposited to form the cathode. Electrochemically patterned masks were used to form the desired pixel sizes. Arrays of pixels ranging in size from 450/spl times/450 /spl mu/m/sup 2/ to 20/spl times/20 /spl mu/m/sup 2/ were realized. In excess of 600 devices were fabricated per array. In each case, the pixels were uniform in size. Devices were tested at a modified probe station in air, and green light emission, which is characteristic of Alq/sub 3/ was easily seen for all sizes.