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In this study we present the fabrication process and characterization techniques to integrate metallic nanostructures on the surface of crystalline Si (c-Si) solar cells. These structures are designed to enhance light trapping at particular wavelengths . Tuning the wavelength to maximize the efficiency can be achieved by changing the sizes and shapes of these structures. A special design of these structures atop c-Si solar cell is expected to affect the absorption near the band gap. These structures have been fabricated by electron beam lithography on c-Si substrates. The processing integration and preliminary characterization results of metallic nanostructures on c-Si solar cells are reported.