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Development of optimum annular illumination: a lithography-TCAD approach

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3 Author(s)
M. Li ; Maryland Univ., College Park, MD, USA ; L. Milor ; W. Yu

The development of advanced steppers with adjustable numerical aperture, and size and shape of the illumination source enables us to improve resolution with less depth-of-focus penalty. However, the optimization of lithography processes for this type of illuminators is costly due to the number of parameters that need to be set. In this paper, we propose an efficient methodology for optimizing the process window for an annular illumination stepper through using litho-TCAD and experimental data. This paper demonstrates the calibration of litho-TCAD to experimental profiles and the use of Taguchi optimization to select the best choice of numerical aperture, inner coherence and outer coherence

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI

Date of Conference:

10-12 Sep 1997