Referenced Items are not available for this document.
The development of advanced steppers with adjustable numerical aperture, and size and shape of the illumination source enables us to improve resolution with less depth-of-focus penalty. However, the optimization of lithography processes for this type of illuminators is costly due to the number of parameters that need to be set. In this paper, we propose an efficient methodology for optimizing the process window for an annular illumination stepper through using litho-TCAD and experimental data. This paper demonstrates the calibration of litho-TCAD to experimental profiles and the use of Taguchi optimization to select the best choice of numerical aperture, inner coherence and outer coherence
Published in:
Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
Date of Conference: 10-12 Sep 1997
- Page(s):
- 317 - 321
- Meeting Date :
- 10 Sep 1997-12 Sep 1997
- ISSN :
- 1078-8743
- Print ISBN:
- 0-7803-4050-7
- INSPEC Accession Number:
- 5774313
- Conference Location :
- Cambridge, MA
- Digital Object Identifier :
- 10.1109/ASMC.1997.630755
- Product Type:
- Conference Publications
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