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Characterization of Channel-Diameter-Dependent Low-Frequency Noise in Silicon Nanowire Field-Effect Transistors

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8 Author(s)
Sang-Hyun Lee ; Department of Electrical Engineering, Pohang University of Science and Technology, Pohang, Korea ; Chang-Ki Baek ; Sooyoung Park ; Dong-Won Kim
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The low-frequency noise in the silicon nanowire field-effect transistor (SNWFET) is characterized using SNWFETs with different channel diameters dNW. The current density and the simulation result indicate that the volume inversion as manifested by the spatial charge distribution is enhanced in smaller dNW. The measured noise data are discussed based on the number and correlated mobility fluctuation model. It is shown that the low-frequency noise decreases in smaller dNW. This dNW-dependent noise behavior is clarified in terms of the effective oxide trap density and the fraction of inversion charges near the Si-SiO2 interface.

Published in:

IEEE Electron Device Letters  (Volume:33 ,  Issue: 10 )