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Statistical modeling of hot-electron and ESD induced degradation in non-isothermal device

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2 Author(s)
Lee, S. ; Florida Inst. of Technol., Melbourne, FL, USA ; Sanders, T.J.

This paper addresses the integrated circuit industry needs for non-isothermal simulation in device reliability analysis, initial input factor sensitivity analysis and their software implementation. The key reliability issues are the hot-electron induced oxide damages which result in the device degradation and electro-static discharge (ESD) damages which may cause failure in circuit operation. The main purpose of this work is to provide a design aid tool to improve device reliability and performance

Published in:
University/Government/Industry Microelectronics Symposium, 1997., Proceedings of the Twelfth Biennial

Date of Conference: 20-23 Jul 1997

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