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Web use and the RIT silicon processes course: triple implanted BJT process laboratory

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1 Author(s)
Pearson, R. ; Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA

A senior or graduate level advanced course covering diffusion, oxidation and ion implantation is intimately coupled to a laboratory fabrication project which uses a triple implanted BJT process. Example process simulations which reinforce lecture material are provided by way of the class Web site. Students simulate the entire process flow, including experimental design splits and collect process data on the Web for comparison and analysis. Pages on ion implantation are used to prepare students for use of the actual equipment. Animated Web applets are used to review some of the basic device physics before electrical testing begins. The electrical test programs, sample test data and setup information are also available through the Web. This paper describes RIT's implementation of these features in course work in microelectronics

Published in:

University/Government/Industry Microelectronics Symposium, 1997., Proceedings of the Twelfth Biennial

Date of Conference:

20-23 Jul 1997