Referenced Items are not available for this document.
The development of ever smaller electronic components by using a photolithographic process is limited by the wavelength of light. For the EUV and X-ray ranges the artificial multilayer coatings in the nanometer range are used as optical elements. From the viewpoint of both technology and optical properties, the tungsten/carbon combination is one of the best for X-ray radiation. In this work we have examined the effects of periodicity, tungsten phase composition, and number of W/C bilayers upon the reflectivity of hard X-rays. The W/C multilayers have been prepared by sequential RF/DC magnetron sputtering and characterized by GISAXS, TEM, and X-ray reflectivity methods.
Published in:
MIPRO, 2011 Proceedings of the 34th International Convention
Date of Conference: 23-27 May 2011
- Page(s):
- 27 - 30
- Print ISBN:
- 978-1-4577-0996-8
- INSPEC Accession Number:
- 12137386
- Conference Location :
- Opatija
- Product Type:
- Conference Publications
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