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On the technology and ecosystem of 3D / TSV manufacturing

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10 Author(s)
Hummler, K. ; 3D Interconnect Div., SEMATECH, Albany, NY, USA ; Smith, Larry ; Caramto, R. ; Edgeworth, R.
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Three-dimensional (3D) die stacking using through silicon via (TSV) promises significant improvements in performance, power consumption and size over traditional edge-connected die stacking (e.g. wire bonds) or package-on-package (PoP) based approaches. 3D integrated circuits (3D-IC) using TSV will enable new system in package (SiP) applications, especially where ultra-high memory bandwidth at moderate power consumption is needed. This paper describes the technology elements for a successful implementation of TSV in high volume manufacturing (HVM) with special focus on the so-called “TSV mid” integration flow being developed at SEMATECH. The maturity and readiness of each process module for HVM is assessed. In addition to technological feasibility and manufacturing readiness, 3D-IC adoption requires an environment of agreed upon specifications, standards, and tools (3D ecosystem). Progress toward a well defined 3D ecosystem by SEMATECH and many other organizations is described in part III of this paper.

Published in:
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI

Date of Conference: 16-18 May 2011

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